- University of Lodz
- Faculty of Chemistry
- Department of Materials Technology and Chemistry
- Experimental techniques and apparatus
- RF plasma
RF plasma
Diener Zepto RF plasma chamber
Low-temperature plasma provides various possibilities for modifying surfaces. It allows for precise cleaning - removal of organic contaminants, plasma activation of surfaces, etching of substrates, such as silicon or plastics (surface structuring) and coating elements with chemical compounds in order to modify and change their physicochemical properties. Preparation of hydrophobic and hydrophilic layers.
